Computer simulation of electrochemical nanostructuring induced by supersaturation conditions.

M. M. MARISCAL; E. P. M. LEIVA; S. A. DASSIE

JOURNAL OF ELECTROANALYTICAL CHEMISTRY

ELSEVIER

Lugar: Amsterdam-The Netherlands; Año: 2007 vol. 607 p. 10 - 10

0022-0728

p class="MsoNormal" style="MARGIN: 0cm 0cm 0pt; mso-layout-grid-align: none">Abstract First steps are taken towards computer simulation of the atomistic mechanism taking place during the supersaturation induced local metal deposition method, as developed by Schindler and coworkers [D. Hofmann, W. Schindler, J. Kirchner, Appl. Phys. Lett. 73 (1998) 3279]. Using a combination of stochastic Langevin dynamics (LD) and deterministic atom dynamics (AD), di.erent results are observed depending on the model systems considered. For instance, when a pro.le of neutral di.using species is used, atom dispersion over the whole electrode was found, whereas when charged species are introduced to the model system, a clear de.nite nucleation area was observed underneath the tip. The present computer