Side-on versus end-on bonding of O2 to the FSO3 radical: Matrix isolation and ab initio study of FSO5

HELMUT BECKERS; PLACIDO GARCIA; HELGE WILLNER; GUSTAVO A. ARGÜELLO; C.J. COBOS; JOSEPH S. FRANCISCO

ANGEWANDTE CHEMIE

Año: 2007 vol. 46 p. 3754 - 3754

0570-0833

font face="AdvPS_TTR" size="1"> Oxy radicals of non-metals such as nitrogen, chlorine, or sulfur play an important part in atmospheric chemistry. They generally form weak complexes with dioxygen. A recent study[1] on the kinetics of formation and the decomposition of the FSO3/O2 complex attracted our interest. The intermediate formed by laser flash photolysis (l=193 nm) of FSO2OF in the presence of O2 features a strong visible absorption at 450