Quantum yield in the gas phase photolysis of perfluoroacetyl chloride: A comparison with related compuonds

DANIEL E. WEIBEL; GERARDO A. ARGUELLO; STARICCO, ESTHER R. DE; STARICCO, EDUARDO H

JOURNAL OF PHOTOCHEMISTRY AND PHOTOBIOLOGY A-CHEMISTRY

Año: 1995 vol. 86 p. 27 - 27

1010-6030

span lang="en" style="FONT-SIZE: 14pt; LINE-HEIGHT: 115%; FONT-FAMILY: "Times New Roman","serif"; mso-fareast-language: ES-AR; mso-ansi-language: EN-US; mso-fareast-font-family: Calibri; mso-bidi-language: AR-SA">The photolysis of perfluoroacetyl chloride vapour was studied in the pressure range 4.6-59.9 Torr and with addition of inert gas up to 535.2 Torr using light of 254 and 280 nm. The quantum yield for the decomposition of CF3COCl taken as qO[CF3Cl +2C2F6] =0.98 +0.13 was not affected by the total pressure, the intensity and the wavelength of the light within the studied range of conditions. In the presence of c-C6H12 a clear hydrogen abstraction reaction took place indicating the presence of CF3 radicals. An upper limit for the rate of hydrogen abstraction of log kH(cm 3 mol-1 s-l)=7.9 at 298 K was obtained. Light emission was not observed over the range 330-600 nm. Mechanisms for the decomposition of perfluoroacyl halides are discussed.