The electrochemical response of thin, chemically precipitated nickel hydroxide layers containing inserted hydroxide ions

R. E. CARBONIO; V. A. MACAGNO; A. J. ARVÍA

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Lugar: Amsterdam; Año: 1984 vol. 177 p. 217 - 217

p style="TEXT-ALIGN: justify; LINE-HEIGHT: normal; MARGIN: 0cm 0cm 0pt; TEXT-AUTOSPACE: ; mso-layout-grid-align: none" class="MsoNormal">The electrochemical response of thin nickel hydroxide electrodes prepared by chemical precipitation on a conducting substrate (platinum, vitreous carbon) has been investigated in base solution at 25oC. The anodic to cathodic charge ratio related to the Ni(II)/Ni(III) redox couple evaluated from the voltammograms when OH- ions are inserted into the nickel hydroxide intersheets is greater than one. OH- ion insertion is achieved either by electroreducing molecular oxygen or by immersion of the electrode in a concentrated base (NaOH, LiOH). The electrooxidation of inserted OH- ions is explained through a catalytic process involving the participation of the Ni(II) + Ni(II1) electrochemical reaction. The r