Potentiodynamic response of the Ni(OH)2/NiOOH redox couple at the inner layer of the complex interphase

R. E. CARBONIO; V. A. MACAGNO; M. C. GIORDANO; J. R. VILCHE; A. J. ARVÍA

SPRINGER

Lugar: Berlin; Año: 1982 vol. 12 p. 121 - 121

p style="TEXT-ALIGN: justify; LINE-HEIGHT: normal; MARGIN: 0cm 0cm 0pt; TEXT-AUTOSPACE: ; mso-layout-grid-align: none" class="MsoNormal">The electrochemical response of the Pt/Ni(OH)2 interface subjected to potentiodynamic sweeps shows the contribution of the Ni(OH)2/Ni(OOH) redox couple immediately attached to the Pt(O) surface, when the substrate surface to Ni(OH)2 layer volume ratio is varied. A comparison with previously published results shows that the response of the innermost portion of the Ni(OH)2/NiOOH layer depends on the characteristic of the substrate, the temperature, the electrolyte concentration, the degree of hydration of the Ni(OH)2 film and the hydrophobicity of the substrate. The results indicate that the water content of the inner film is probably lower than that of the bulk, the Ni(III) species probably